Publications
Publications by Research Area
Publications by Division
X Author: André Anders
2014
Anders, André, Pavel A Ni, and Joakim Andersson."Drifting Ionization Zone in DC Magnetron Sputtering Discharges at Very Low Currents."IEEE Transactions on Plasma Science
42.10 (2014) 2578 - 2579. DOI
Panjan, Matjaž, Robert Franz, and André Anders."Asymmetric particle fluxes from drifting ionization zones in sputtering magnetrons."Plasma Sources Science and Technology
23.2 (2014) 025007. DOI
2013
Anders, André, Matjaž Panjan, Robert Franz, Joakim Andersson, and Pavel A Ni."Drifting potential humps in ionization zones: The “propeller blades” of high power impulse magnetron sputtering."Applied Physics Letters
103.14 (2013) 144103. DOI
Andersson, Joakim, Pavel A Ni, and André Anders."Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas."Applied Physics Letters
103.5 (2013) 054104. DOI
Lim, Sunnie H.N, Jan Isidorsson, Lizhong Sun, B. B Leo Kwak, and André Anders."Modeling of optical and energy performance of tungsten-oxide-based electrochromic windows including their intermediate states."Solar Energy Materials and Solar Cells
108 (2013) 129 - 135. DOI
Zhu, Yuankun, Rueben J Mendelsberg, Jiaqi Zhu, Jiecai Han, and André Anders."Dopant-induced band filling and bandgap renormalization in CdO: In films."Journal of Physics D: Applied Physics
46.19 (2013). DOI
2012
Anders, André."Self-organization and self-limitation in high power impulse magnetron sputtering."Applied Physics Letters
100.22 (2012). DOI
Anders, André, Pavel A Ni, and Albert Rauch."Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering."Journal of Applied Physics
111.5 (2012) 053304. DOI
Zhu, Yuankun, Rueben J Mendelsberg, Sunnie H.N Lim, Jiaqi Zhu, Jiecai Han, and André Anders."Improved structural and electrical properties of thin ZnO:Al films by dc filtered cathodic arc deposition."Journal of Materials Research
27.05 (2012) 857 - 862. DOI
Anders, André, Jiří Čapek, Matêj Hála, and Ludvik Martinu."The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering."Journal of Physics D: Applied Physics
45.1 (2012) 012003. DOI
2011
Anders, André, and Jeff Brown."A Plasma Lens for Magnetron Sputtering."IEEE Transactions on Plasma Science
39.11 (2011) 2528 - 2529. DOI
Garcia, Guillermo, Raffaella Buonsanti, Evan L Runnerstrom, Rueben J Mendelsberg, Anna Llordes, André Anders, Thomas J Richardson, and Delia J Milliron."Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals."Nano Letters
11.10 (2011) 4415 - 4420. DOI
Mendelsberg, Rueben J, Sunnie H.N Lim, Yuankun Zhu, Joe Wallig, Delia J Milliron, and André Anders."Achieving high mobility ZnO:Al at very high growth rates by dc filtered cathodic arc deposition."Journal of Physics D: Applied Physics
44.23 (2011) 232003-232007. DOI
2010
Ni, Pavel A, and André Anders."Supersonic metal plasma impact on a surface: an optical investigation of the pre-surface region."Journal of Physics D: Applied Physics
43.13 (2010). DOI
2009
Anders, André, Sunnie H.N Lim, Kin Man Yu, Joakim Andersson, Johanna Rosén, Mike McFarland, and Jeff Brown."High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition."Thin Solid Films
(2009).
2008
Endrino, Jose L, Jose F Marco, Phitsanu Poolcharuansin, Ayalasomayajula R Phani, Matthew Allen, José M Albella, and André Anders."Functionalization of Hydrogen-free Diamond-like Carbon Films using Open-air Dielectric Barrier Discharge Atmospheric Plasma Treatments."Applied Surface Science
254.17 (2008). DOI
Andersson, Joakim, Arutiun P Ehiasarian, and André Anders."Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma."Applied Physics Letters
93.7 (2008) 71504. DOI
Anders, André."Deposition Rates of High Power Impulse Magneton Sputtering."51st Annual Technical Meeting of the Society of Vacuum Coaters
(2008).
Field, Matthew R, Dougal G McCulloch, Sunnie H.N Lim, André Anders, Vicki J Keast, and R.W Burgess."The structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering."Journal of Physics: Condensed Matter
20 (2008) 175216. DOI
Anders, André."Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions."Applied Physics Letters
92.20 (2008). DOI
Anders, André, Jonathan L Slack, and Thomas J Richardson."Electrochromically switched, gas-reservoir metal hydride devices with application to energy-efficient windows."Thin Solid Films
1 (2008).
Andersson, Joakim, and André Anders."Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion."Applied Physics Letters
92 (2008) 221503.
Andersson, Joakim, and André Anders."Self-sputtering far above the runaway threshold: an extraordinary metal ion generator."Physical Review Letters
(2008).
Horwat, David, and André Anders."Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper."Journal of Physics D
41 (2008) 135210-1-6.
2007
Mohamed, Sodky H, and André Anders."Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering."Thin Solid Films
515.13 (2007) 5264-5269. DOI