Publications
Publications by Research Area
Publications by Division
X Author: André Anders
2007
Anders, André, and Georgy Yu Yushkov."A low-energy linear oxygen plasma source."Review of Scientific Instruments
78.4 (2007).
Anders, André, Joakim Andersson, David Horwat, and Arutiun P Ehiasarian."Physics of High Power Impulse Magnetron Sputtering."ISSP2007: The 9th International Symposium on Sputtering & Plasma Processes
(2007).
Anders, André."Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective."50th Technical Annual Meeting of the Society of Vacuum Coaters
(2007).
2006
Anders, André, Nitisak Pasaja, Sunnie H.N Lim, Tim C Petersen, and Vicki J Keast."Plasma biasing to control the growth conditions of diamond-like carbon."Surface and Coatings Technology
201.8 (2006) 4628-4632. DOI
Anders, André, Nitisak Pasaja, Sakon Sansongsiri, and Sunnie H.N Lim."Filtered cathodic arc deposition with ion-species-selective bias."Review of Scientific Instruments
(2006).
Anders, André, Eungsun Byon, Dong-Ho Kim, Kentaro Fukuda, and Sunnie H.N Lim."Smoothing of ultrathin silver films by transition metal seeding."Applied Physics Letters
(2006).
Mohamed, Sodky H, and André Anders."Structural, optical and electrical properties of WOxNy films deposited by reactive dual magnetron sputtering."Surface and Coatings Technology
201.6 (2006) 2977-2983. DOI
2005
Anders, André."Energetic or Not Energetic: Considerations for Fabricating Nanostructures by Physical Vapor Deposition."NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectrics, January 10-13
(2005).
Pelletier, Jacques, and André Anders."Plasma-Based Ion Implantation and Deposition: A Review of Physics, Technology, and Applications."IEEE Transactions on Plasma Science
33 (2005) 1944-1959.
2004
Byon, Eungsun, Jong-Kuk Kim, Sik-Chol Kwon, and André Anders."Effect of Ion Mass and Charge State on Transport Vacuum Arc Plasmas Through a Biased Magnetic Filter."IEEE Transactions on Plasma Science
32.2 (2004) 433-439. DOI
Rosén, Johanna, André Anders, Stanislav Mráz, and Jochen M Schneider."Charge-State-Resolved Ion Energy Distributions of Aluminum Vacuum Arcs."Journal of Applied Physics
97 (2004).
Anders, André."Observation of Self-Sputtering in Energetic Condensation of Metal Ions."Applied Physics Letters
85 (2004) 6137-6139.
Anders, André."Time-Dependence of Ion Charge State Distributions of Vacuum Arcs: An Interpretation Involving Atoms and Charge Exchange Collisions."IEEE Transactions on Plasma Science
33 (2004) 205-209.
2003
Anders, André."Physics of Arcing, and Implications to Sputter Deposition."International Conference on Coatings on Glass
(2003).
Anders, André, and Othon R Monteiro."Surface Engineering of Glazing Materials and Structures Using Plasma Processes."Glass Processing Days 2003
(2003).
Byon, Eungsun, and André Anders."Effect of Underlayer on Coalescence of Silver Islands Grown by Filtered Cathodic Arc Deposition."The International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2003)
(2003).
Byon, Eungsun, Thomas W.H Oates, and André Anders."Coalescence of Nanometer Silver Islands on Oxides Grown by Filtered Cathodic Arc Deposition."Applied Physics Letters
82 (2003) 1634-1636.
Anders, André."Fundamentals of Pulsed Plasmas for Materials Processing."Surface and Coatings Technology
183 (2003) 301-311.
2002
Anders, André."Materials, processes, and issues in low-emissivity and solar control coatings."
(2002).
Byon, Eungsun, and André Anders."Bias and Self-Bias of Magnetic Macroparticle Filters for Cathodic Arc Plasmas."Journal of Applied Physics
93 (2002) 8890-8897.
1999
Anders, André, Robert A MacGill, and Michael D Rubin."Evaluation of the Plasma Distribution of a Quasi-Linear Constricted Plasma Source."IEEE Transactions on Plasma Science
27.1 (1999) 82-83.
1997
Leung, Michael S.H, Ralf Klockenbrink, Christian F Kisielowski, Hiroaki Fujii, Joachim Krüger, Sudhir G Subramanya, André Anders, Zuzanna Liliental-Weber, Michael D Rubin, Eicke R Weber, and Joachim Krüger."Pressure Controlled GaN MBE Growth Using a Hollow Anode Nitrogen Ion Source."Materials Research Society Proceedings
449.221 (1997). DOI