Crystalline Growth of Wurtzite GAN on (111) GaAs

Publication Type

Conference Paper

Authors

DOI

Abstract

Gallium Nitride films were grown on (111) Gallium Arsenide substrates using reactive rf magnetron sputtering. Despite a 20% lattice mismatch and different crystal structure, wurtzite GaN films grew epitaxially in basal orientation on (111) GaAs substrates. Heteroepitaxy was observed for growth temperatures between 550-600°C. X-ray diffraction patterns revealed (0002) GaN peak with a full-width-half-maximum (FWHM) as narrow as 0.17°. Possible surface reconstructions to explain the epitaxial growth are presented.

Journal

Materials Research Society Symposium

Volume

242

Year of Publication

1992

Organization

Research Areas

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