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X Author: Toshiro Itani
2019
Stern, Rebecca D, Danielle C Hutchison, Morgan R Olsen, Lev N Zakharov, May Nyman, Kristin A Persson, Kurt G Ronse, Paolo A Gargini, Patrick P Naulleau, and Toshiro Itani."Alkyltin Keggin clusters as EUVL photoresist technology."International Conference on Extreme Ultraviolet Lithography 2019International Conference on Extreme Ultraviolet Lithography 2019
(2019). DOI